Apparatus and methods for treating substrates

This invention is related to an apparatus for treating substrates. According to the present invention, the substrate is cleaned by injecting high temperature and high pressure steam on substrate. A steam generator is configured to continually provide steam on substrate. After cleaning by steam, clea...

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Bibliographic Details
Main Author LEE SUNG-HEE,LEE MYUNG-JIN
Format Patent
LanguageEnglish
Published 03.10.2007
Subjects
BLASTING
CLEANING
CLEANING IN GENERAL
HEATING
LIGHTING
MECHANICAL ENGINEERING
METHODS OF STEAM GENERATION
PERFORMING OPERATIONS
PIPE-LINE SYSTEMS
PIPE-LINES
PREVENTION OF FOULING IN GENERAL
STEAM BOILERS
STEAM GENERATION
STORING OF DISTRIBUTING GASES OR LIQUIDS
TRANSPORTING
WEAPONS
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Summary:This invention is related to an apparatus for treating substrates. According to the present invention, the substrate is cleaned by injecting high temperature and high pressure steam on substrate. A steam generator is configured to continually provide steam on substrate. After cleaning by steam, cleaning by brush may be followed.
Bibliography:Application Number: CN200710003655