Plasma generation apparatus and work processing apparatus
A plasma generation apparatus is provided which includes: a microwave generation portion which generates a microwave; a gas supply portion which supplies a gas to be turned into plasma; a plasma generation nozzle which includes a reception member receiving the microwave, and turns the gas into plasm...
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Main Author | |
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Format | Patent |
Language | English |
Published |
29.08.2007
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Subjects | |
Online Access | Get full text |
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Summary: | A plasma generation apparatus is provided which includes: a microwave generation portion which generates a microwave; a gas supply portion which supplies a gas to be turned into plasma; a plasma generation nozzle which includes a reception member receiving the microwave, and turns the gas into plasma based on the energy of the received microwave and emits the plasma gas; and a photo-detection unit which detects light emitted by the plasma gas and generates electrical information. |
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Bibliography: | Application Number: CN2007179921 |