Plasma generation apparatus and work processing apparatus

A plasma generation apparatus is provided which includes: a microwave generation portion which generates a microwave; a gas supply portion which supplies a gas to be turned into plasma; a plasma generation nozzle which includes a reception member receiving the microwave, and turns the gas into plasm...

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Bibliographic Details
Main Author MATSUUCHI HIDETAKA,IWASAKI RYUICHI,MANKAWA HIROFUMI,MASUDA SHIGERU,HAYASHI HIROFUMI,MIKE MASAAKI
Format Patent
LanguageEnglish
Published 29.08.2007
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Summary:A plasma generation apparatus is provided which includes: a microwave generation portion which generates a microwave; a gas supply portion which supplies a gas to be turned into plasma; a plasma generation nozzle which includes a reception member receiving the microwave, and turns the gas into plasma based on the energy of the received microwave and emits the plasma gas; and a photo-detection unit which detects light emitted by the plasma gas and generates electrical information.
Bibliography:Application Number: CN2007179921