Unequal depth micro nano slot structure forming method

This invention provides a method for forming nanometer grooves of different depths including the following steps: first of all making a specific continuous area structure on the surface of a binary nanometer groove array structure, then etching the continuous structure and the groove structure simul...

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Bibliographic Details
Main Author XIAOCHUN,DU DONG
Format Patent
LanguageEnglish
Published 22.08.2007
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
MANUFACTURE OR TREATMENT THEREOF
NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS,MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES ASDISCRETE UNITS
NANOTECHNOLOGY
PERFORMING OPERATIONS
SEMICONDUCTOR DEVICES
TRANSPORTING
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Summary:This invention provides a method for forming nanometer grooves of different depths including the following steps: first of all making a specific continuous area structure on the surface of a binary nanometer groove array structure, then etching the continuous structure and the groove structure simultaneously with an anisotropic dry etching technology, in the process, the continuous area structure will modulte the specific region of the groove structure to get a continuously modulated nanometer structure of the groove depth.
Bibliography:Application Number: CN2007164689