Chemical vapor deposition apparatus for flat display

• Main Author: KIM NAM-JIN,LEE SUNG-MIN,CHANG SANG-LAE
• Format: Patent
• Language: English
• Published: 08.08.2007
• Subjects: CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; GLASS; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; JOINING GLASS TO GLASS OR OTHER MATERIALS; METALLURGY; MINERAL OR SLAG WOOL; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

A chemical vapor deposition apparatus for a flat display includes a susceptor installed in a chamber and having an upper surface on which the flat display subject to deposition is loaded, and a cooling portion buried in at least a portion of the susceptor and forcibly cooling the susceptor that is heated during a deposition process. Since the susceptor is forcibly cooled to lower the temperature of the susceptor to an appropriate level within a relatively short time, the standby time for the maintenance and repair time of the apparatus can be reduced. Thus, the operation rate of the apparatus and productivity thereof are improved, and the generation of a process loss is prevented.