Aperture diaphragm assembly for high power laser beams

An aperture stop assembly for use in an electromagnetic radiation system may include an aperture stop made of a material at least partly transparent to an applied electromagnetic radiation. At least a portion of the aperture stop may be formed at an edge of an aperture to deflect electromagnetic rad...

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Bibliographic Details
Main Author SALLANDER JESPER
Format Patent
LanguageChinese
English
Published 13.08.2008
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
DEVICES USING STIMULATED EMISSION
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:An aperture stop assembly for use in an electromagnetic radiation system may include an aperture stop made of a material at least partly transparent to an applied electromagnetic radiation. At least a portion of the aperture stop may be formed at an edge of an aperture to deflect electromagnetic radiation into the at least partially transparent material.
Bibliography:Application Number: CN200580011931