A METHOD OF DISSOLVING AND/OR INHIBITING THE DEPOSITION OF SCALE ON A SURFACE OF A SYSTEM

• Main Authors: DECKER, GUNTER, BORST, JOSEPH P, LEUNG, VICTOR, ZACK, KENNETH L, PRZYBYLA, DAVID E, DUROCHER, DAVID
• Format: Patent
• Language: English; French
• Published: 06.10.2020
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE

A method of dissolving and/or inhibiting the deposition of scale on a surface of a system comprises the step of bringing the surface of the system into contact with a composition. The composition can comprise from about 3 to about 15 parts by weight of a chelating component. The chelating component is selected from the group of MGDA, NTA, HEDTA, GLDA, EDTA, DTPA, and mixtures thereof. The composition can further comprise from about 3 to about 15 parts by weight of an acidic component, which is different than the chelating component. The composition can further comprise at least about 60 parts by weight of water. Each of the parts by weight ranges above are based on 100 parts by weight of the composition. The composition may further comprise a surfactant component and/or a corrosion inhibitor. L'invention concerne une méthode de dissolution et/ou d'inhibition du dépôt de tartre sur une surface d'un système comprenant l'étape de mise en contact de la surface du système avec une composition. La composition peut comprendre entre environ 3 et environ 15 parties massiques d'un composé chélateur. Le composé chélateur est sélectionné dans le groupe suivant : MGDA, NTA, HEDTA, GLDA, EDTA, DTPA et des mélanges de ceux-ci. La composition peut aussi comprendre entre environ 3 et environ 15 parties massiques d'un composé acide différent du composé chélateur. La composition peut comprendre de plus au moins environ 60 parties massiques d'eau. Chacune des gammes de fractions massiques mentionnées ci-dessus est définie sur une base de 100 parties massiques de la composition. La composition peut comprendre de plus un composé tensioactif et/ou un inhibiteur de corrosion.