A PROCESS AND A DEVICE TO CLEAN SUBSTRATES

• Main Authors: KUMAR, LALIT, KAMKAR, KIRTAN SHRAVAN, SAH, AMIT, JAYARAMAN, SURESH SAMBAMURTHY, SHRESTH, RUDRA SAURABH
• Format: Patent
• Language: English; French
• Published: 17.05.2016
• Subjects: APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; ATOMISING APPARATUS; CLEANING; CLEANING IN GENERAL; COFFEE MILLS; DOMESTIC ARTICLES OR APPLIANCES; DOMESTIC WASHING OR CLEANING; FURNITURE; HUMAN NECESSITIES; NOZZLES; PERFORMING OPERATIONS; PREVENTION OF FOULING IN GENERAL; SPICE MILLS; SPRAYING APPARATUS; SPRAYING OR ATOMISING IN GENERAL; SUCTION CLEANERS IN GENERAL; TRANSPORTING

In particular a porous substrate (FS) like a fabric. Process to clean a substrate, comprising a step of subjecting the substrate to an air-water spray (SPR), generated using a spraying means (N) comprising an air passage (OPA) and a water passage (OPW), wherein air is greater than 90% by volume of the spray, the air velocity is greater than 80 m/s and wherein said air passage does not coaxially surround said water passage. Device to clean soiled fabric (FS) comprising a feed water container (CW) and an air compressor (AC) in fluid communication with a spray nozzle (N) comprising an air passage and a water passage, said device being capable of generating an air pressure in the range of 1 to 3 bar (absolute) and an air velocity greater than 80 m/s at the exit of said nozzle; and the air is greater than 90 % volume of said spray, and wherein said air passage does not coaxially surround said water passage. An external mix spray nozzle is especially preferred in the device.