METHOD AND DEVICE FOR IMAGING A MASK ONTO A SUBSTRATE

The invention relates to a method for imaging a mask (1) onto a substrate (2 ) by means of an illuminating unit (8) and an optical unit (9). The invention also relates to a device for carrying out the method. The aim of the inventi on is to create a method and a device which enable the mask (1) and...

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Bibliographic Details
Main Authors KAPLAN, ROLAND, SOLLNER, JURGEN
Format Patent
LanguageEnglish
French
Published 16.10.2003
Edition7
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The invention relates to a method for imaging a mask (1) onto a substrate (2 ) by means of an illuminating unit (8) and an optical unit (9). The invention also relates to a device for carrying out the method. The aim of the inventi on is to create a method and a device which enable the mask (1) and the smaller structures thereof to be imaged onto the substrate (2) in a precise manner, with high functional reliability, and which enable the distortions of the substrate (2) to be corrected. To this end, the illuminating unit (8) and th e optical unit (9) are displaced in relation to the mask (1) and the substrate (2), distortions of the substrate (2) are detected, and the imaging of the mask (1) is distorted according to the detected distortions by means of the optical unit (9) and is adapted to the distortions of the substrate (2).</SD OAB>
Bibliography:Application Number: CA20032482155