METHOD FOR THERMALLY TREATING SUBSTRATES

To increase the temperature homogeneity on the surface of a substrate that is to be thermally treated, a method for thermally treating substrates is provided, according to which the substrate is heated by several separately controllable heating elements. A desired-value profile is predefined for eac...

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Bibliographic Details
Main Authors DRESS, PETER, DIETZE, UWE, SZEKERESCH, JAKOB, SAULE, WERNER
Format Patent
LanguageEnglish
French
Published 13.04.2010
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Summary:To increase the temperature homogeneity on the surface of a substrate that is to be thermally treated, a method for thermally treating substrates is provided, according to which the substrate is heated by several separately controllable heating elements. A desired-value profile is predefined for each of said heating elements. The method comprises the following steps: locally-analysed measurement of the temperature of the surface of the substrate that faces away from the heating elements, during the thermal treatment; determination of the temperature inhomogeneities occurring on the substrate surface; definition of new desired-value profiles based on said temperature inhomogeneities; and preparation of the new desired-value profiles for subsequent treatments.
Bibliography:Application Number: CA20012436424