ELECTRON BEAM APPARATUS HAVING A LOW LOSS BEAM PATH
An apparatus for irradiating an article, particularly a multi-layer article, with electron beam radiation is provided. The apparatus contains a window having a short unit path length and allows for controlled irradiation of an article such that upper portions of the article receive significantly hig...
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Main Authors | , , , , |
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Format | Patent |
Language | English French |
Published |
08.03.2001
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | An apparatus for irradiating an article, particularly a multi-layer article, with electron beam radiation is provided. The apparatus contains a window having a short unit path length and allows for controlled irradiation of an article such that upper portions of the article receive significantly higher electron beam dosages than lower portions of the article. Such differential dosage allows for modification of an article comprising a coating compositio n that can be modified by electron beam irradiation on a substrate that is vulnerable to degradation from electron beam radiation. A method of irradiating an article with electron beams, and products manufactured using the apparatus and method of the invention, are also disclosed. |
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Bibliography: | Application Number: CA20002384608 |