SHIELDING FOR ARC SUPPRESSION IN ROTATING MAGNETRON SPUTTERING SYSTEMS

• Main Authors: DICKEY, ERIC R, BJORNARD, ERIK J
• Format: Patent
• Language: English; French
• Published: 26.11.2002
• Edition: 5
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

A cathode body (12) for a rotating cylindrical magnetron (10) wherein the magnetron provides a sputtering zone extending along the length of the cathode body (12) and circumferentially along a relatively narrow region thereof. The cathode body (12) includes an elongated tubular member (14) having a target material (16) at t he outer surface thereof. A collar (32) of electrically- conductive material is located at at least one end of the tubular member (14 ), and extends along the tubular member (14) from that one end into the erosion zone. A sleeve of electrically-conductive material may extend circumferentially around the collar (32).