PRODUCTION METHOD OF SUPERCONDUCTIVE THIN FILM AND A DEVICE THEREOF

: A superconductive thin film is made by a procedure as follows: in a vacuum vessel having an internal pressure maintained at least as low as 10-2 torr, each metal of the component elements of the superconductive thin film is charged into a crucible to be heated. The resulting evaporated metallic el...

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Bibliographic Details
Main Author HIGUCHI, FUMINORI
Format Patent
LanguageEnglish
French
Published 13.08.1991
Edition5
Subjects
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Summary:: A superconductive thin film is made by a procedure as follows: in a vacuum vessel having an internal pressure maintained at least as low as 10-2 torr, each metal of the component elements of the superconductive thin film is charged into a crucible to be heated. The resulting evaporated metallic element is spouted from the crucible as a cluster beam. Each spouted metallic stream is ionized and accelerated by an electric field and impinges on a substrate. Oxygen gas is directed towards the substrate. The heating of the crucibles is so controlled that the amounts of the respective metallic streams are in accordance with a predetermined mole ratio. In this way there is formed on the substrate a superconductive thin film having improved properties of adhesion, and the manufacturing procedure is simplified.
Bibliography:Application Number: CA19880562760