PROCESS AND APPARATUS FOR SUPPORTING CRYSTALLINE WAFERS
The invention relates to a process and apparatus for supporting crystalline wafers utilizing the suction effect of flowing gas on the crystalline wafers. An almost pointlike support of the crystalline wafer is achieved. Furthermore, the invention relates to a holding tool for carrying out the proces...
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Main Authors | , |
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Format | Patent |
Language | English French |
Published |
06.11.1984
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Edition | 3 |
Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to a process and apparatus for supporting crystalline wafers utilizing the suction effect of flowing gas on the crystalline wafers. An almost pointlike support of the crystalline wafer is achieved. Furthermore, the invention relates to a holding tool for carrying out the process, which tool has at the center of the holding face, a point-like projection. |
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Bibliography: | Application Number: CA19810386520 |