PROCESSO E DISPOSITIVO PARA A INJECAO DE MATERIA FINAMENTE DIVIDIDA EM UM ESCOAMENTO DE GAS QUENTE E APARELHO DE REACAO E/OU TRATAMENTO DE PELO MENOS UMA MATERIA FINAMENTE DIVIDIDA EM UM ESCOAMENTO DE GAS QUENTE
The invention relates to a process and device for injecting at least one stream of a finely divided material into a hot gaseous flow, such as a plasma jet. According to the invention,-there is interposed on the path of said hot gaseous flow a screen pierced with a plurality of orifices spatially dis...
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Main Authors | , |
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Format | Patent |
Language | Portuguese |
Published |
09.07.1985
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Edition | 4 |
Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to a process and device for injecting at least one stream of a finely divided material into a hot gaseous flow, such as a plasma jet. According to the invention,-there is interposed on the path of said hot gaseous flow a screen pierced with a plurality of orifices spatially distributed about said hot gaseous flow so as to fractionate the latter into a plurality of elementary flows at least approximately in the same general direction; and-said stream of finely divided material, is led to at least one nozzle at least partially surrounded by said orifices, in order to create at least one stream of finely divided material whose direction is at least approximately similar to that of said elementary hot gaseous flows and surrounded by at least certain of them. The invention is particularly applicable to plasma chemistry. |
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Bibliography: | Application Number: BR19848403962 |