PROCESSO E DISPOSITIVO PARA A INJECAO DE MATERIA FINAMENTE DIVIDIDA EM UM ESCOAMENTO DE GAS QUENTE E APARELHO DE REACAO E/OU TRATAMENTO DE PELO MENOS UMA MATERIA FINAMENTE DIVIDIDA EM UM ESCOAMENTO DE GAS QUENTE

• Main Authors: JEAN-PIERRE SERRANO, JEAN FEUILLERAT
• Format: Patent
• Language: Portuguese
• Published: 09.07.1985
• Edition: 4
• Subjects: APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; ATOMISING APPARATUS; CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING; NOZZLES; PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS; SPRAYING APPARATUS; SPRAYING OR ATOMISING IN GENERAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; THEIR RELEVANT APPARATUS; TRANSPORTING

The invention relates to a process and device for injecting at least one stream of a finely divided material into a hot gaseous flow, such as a plasma jet. According to the invention,-there is interposed on the path of said hot gaseous flow a screen pierced with a plurality of orifices spatially distributed about said hot gaseous flow so as to fractionate the latter into a plurality of elementary flows at least approximately in the same general direction; and-said stream of finely divided material, is led to at least one nozzle at least partially surrounded by said orifices, in order to create at least one stream of finely divided material whose direction is at least approximately similar to that of said elementary hot gaseous flows and surrounded by at least certain of them. The invention is particularly applicable to plasma chemistry.