solução aquosa de (sal) de ácido poli (met) acrílico e processo para preparar a mesma

• Main Authors: JUNICHI CHOSA, AKIHIKO KANZAKI, NORIHIRO WAKAO
• Format: Patent
• Language: Portuguese
• Published: 10.07.2018
• Subjects: ADHESIVES; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; CORRECTING FLUIDS; DYES; FILLING PASTES; INKS; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; POLISHES; PREPARATION OF CARBON BLACK; THEIR PREPARATION OR CHEMICAL WORKING-UP; TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS,TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS; USE OF MATERIALS THEREFOR; WOODSTAINS

An object of the present invention is to provide an aqueous poly(meth)acrylic acid (salt) solution having high dispersibility of inorganic substances and demonstrating dispersibility having sufficient stability over time, and a process for preparing the same. The present invention relates to an aqueous poly(meth)acrylic acid (salt) solution comprising a poly(meth)acrylic acid (salt) having a weight average molecular weight of 1000 to 10000 polymerized in the presence of a phosphorus compound containing hypophosphorous acid (salt), wherein the phosphorus compound contains 0 to 0.3% by mass of a phosphorous acid (salt) based on 100% by mass of the phosphorus compound, and the aqueous poly(meth)acrylic acid (salt) solution contains 0 to 10000 ppm of an inorganic anion; and a process for preparing an aqueous poly(meth)acrylic acid (salt) solution comprising the step of polymerizing a monomer in an aqueous solvent in the presence of a phosphorus compound containing hypophosphorous acid (salt), wherein the monomer contains a (meth)acrylic acid (salt) as an essential component, the phosphorus compound contains 0 to 0.3% by mass of a phosphorous acid (salt) based on 100% by mass of the phosphorus compound, the poly(meth)acrylic acid (salt) has a weight average molecular weight of 1000 to 10000, and the aqueous poly(meth)acrylic acid (salt) solution contains 0 to 10000 ppm of an inorganic anion.