estrutura compósita de substrato transparente e eletrodo

• Main Authors: ULF BLIESKE, ANNE DURANDEAU
• Format: Patent
• Language: Portuguese
• Published: 09.08.2011
• Subjects: BASIC ELECTRIC ELEMENTS; CABLES; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMISTRY; CONDUCTORS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; GLASS; INSULATORS; JOINING GLASS TO GLASS OR OTHER MATERIALS; METALLURGY; MINERAL OR SLAG WOOL; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS

Glass substrate (1) having an electrode comprises at least one transparent conducting layer (3) based on metal oxide(s) and having RMS (Root Mean Square) surface roughness of at least 3 nm, especially at least 5 nm and/or a mean value of surface roughness pattern of at least 50 nm. Preferred Features: The RMS surface roughness of the transparent conducting layer (3) is 3-30 nm, especially 5-15 nm, and the mean value of the surface roughness pattern is 100-500 nm, preferably 200-400 nm. The surface A of the glass substrate on which the conducting layer (3) is directly or indirectly coated has a RMS roughness of at least 100 nm, preferably 1000-1500 nm, more preferably 1500-2000 nm, and a surface roughness pattern mean value of at least 5 microns (preferably 5-100 microns ), more preferably at least 10 microns (preferably 10-50 microns ). The conducting layer (3) is deposited by pyrolysis, preferably in the gaseous phase, or by cathodic sputtering. The conducting layer (3) is selected from fluorine- or antimony-doped tin oxide, aluminum-doped zinc oxide, and tin-doped indium oxide. It has a resistance per square of at most 30 or 20 Ohm /square and thickness of at most 1000 nm. preferably at least 400 nm, and it is mostly or wholly crystallized. At least one layer functioning as a barrier to species that can diffuse into glass, especially alkalis, or functioning as an optical layer, is arranged between the glass substrate and the conducting layer (3). The barrier layer (2) is based on silicon oxide oxycarbide, oxynitride or nitride, and is deposited by pyrolysis or cathodic sputtering. Independent claims are given for: (a) a glass substrate having an electrode and where the surface roughness of the glass substrate is obtained by chemical etching or by mechanical abrasion using sand; (b) utilization of the substrate in a solar cell; and (c) a solar cell comprising the substrate.