Electron-emitting device and electron source and image- forming apparatus using the same as well as method of manufacturing the same
An electron emitting device having an electron-emitting region formed in electroconductive film is manufactured by a method that includes applying a pulse voltage across an electroconductive film in an atmosphere containing a reductive substance, for example H2, CO or organic substance. In the prefe...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
05.12.2002
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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Summary: | An electron emitting device having an electron-emitting region formed in electroconductive film is manufactured by a method that includes applying a pulse voltage across an electroconductive film in an atmosphere containing a reductive substance, for example H2, CO or organic substance. In the preferred method the pulse width T1 and spacing T2 are related as T2≥5T1. The pulse voltage amplitude may be vamped after an initial period of constancy. |
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Bibliography: | Application Number: AU19960048071 |