Device and process for optimizing the intensity of radiation directed onto sewage and waste water
A device and process for optimizing the intensity of radiation directed onto sewage or waste water has a radiation chamber (11) in which the liquid to be irradiated, which can be given oxidizing agents, is moved solely through the action of adhesive and gravitational forces, as a film, down two cont...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
21.11.1994
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Edition | 5 |
Subjects | |
Online Access | Get full text |
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Summary: | A device and process for optimizing the intensity of radiation directed onto sewage or waste water has a radiation chamber (11) in which the liquid to be irradiated, which can be given oxidizing agents, is moved solely through the action of adhesive and gravitational forces, as a film, down two contoured, facing vertical walls (1), separated by variable but small intervals, past a removable radiation unit (5/6/9) which consists mainly of tube-shaped ultraviolet radiation emitters (9) and, arranged parallel to these, specially designed reflectors (7) by means of which virtually (depending on the reflectivity of the reflector surfaces) the entire ultraviolet radiation emitted is directed onto the liquid film to be irradiated. |
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Bibliography: | Application Number: AU19940066771 |