Method for cleaning methyl chloride contaminated with c1-c3 hydrocarbons and/or isobutane

The invention relates to a method for cleaning methyl chloride contaminated with C1-C3 hydrocarbons and/or isobutane. The invention relates in particular to a method for removing impurities from methyl chloride used in the production of methyl chlorosilanes.

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Bibliographic Details
Main Authors KURT FELDNER, TORSTEN HAUSCHILD, RAINER WEBER, RALF MACKER, GERHARD RUFFERT
Format Patent
LanguageEnglish
Published 09.09.1998
Edition6
Subjects
ACYCLIC OR CARBOCYCLIC COMPOUNDS
ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM
CHEMISTRY
METALLURGY
ORGANIC CHEMISTRY
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Summary:The invention relates to a method for cleaning methyl chloride contaminated with C1-C3 hydrocarbons and/or isobutane. The invention relates in particular to a method for removing impurities from methyl chloride used in the production of methyl chlorosilanes.
Bibliography:Application Number: AU19980064954