Method and apparatus for step and repeat exposures

An excimer laser projection ablation system provides less than the necessary amount of illumination to a substrate to completely ablate a structure. The system then moves the substrate a distance less than the image field at the substrate and provides an additional level of illumination. The system...

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Bibliographic Details
Main Authors ANDREW J OUDERKIRK, ERIC J. BORCHERS, PATRICK R. FLEMING
Format Patent
LanguageEnglish
Published 18.11.1996
Edition6
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
CLADDING OR PLATING BY SOLDERING OR WELDING
CONTACT LENSES
CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MACHINE TOOLS
MATERIALS THEREFOR
METAL-WORKING NOT OTHERWISE PROVIDED FOR
OPTICS
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
SOLDERING OR UNSOLDERING
SPECTACLES
SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURESAS SPECTACLES
TRANSPORTING
WELDING
WORKING BY LASER BEAM
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Summary:An excimer laser projection ablation system provides less than the necessary amount of illumination to a substrate to completely ablate a structure. The system then moves the substrate a distance less than the image field at the substrate and provides an additional level of illumination. The system continues to move the substrate and provide additional illumination until the structures are fully ablated. The method and system for performing an improved step and repeat process preferably are used to create uniform repeating structures or three-dimensional structures.
Bibliography:Application Number: AU19960053255