Microneedle, microcone, and photolithography fabrication methods
Lithography fabrication methods for producing polymeric microneedles, microprobes, and other micron-sized structures with sharp tips. The fabrication process utilizes a single-step bottom-up exposure of photosensitive resin through a photomask micro-pattern, with a corresponding change/increase in r...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
28.07.2022
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Subjects | |
Online Access | Get full text |
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Summary: | Lithography fabrication methods for producing polymeric microneedles, microprobes, and other micron-sized structures with sharp tips. The fabrication process utilizes a single-step bottom-up exposure of photosensitive resin through a photomask micro-pattern, with a corresponding change/increase in refractive index of the resin creating a meta-state waveguide within the resin which focuses down additional transmitted energy and forms a converging shape (first harmonic microcone). Energy is diffracted through the tip of the first harmonic microcone as a second harmonic beam to form a second converging shape (second harmonic shape) adjacent the first microcone, followed by additional tertiary harmonic microcones, which can be built upon these structures with application of additional energy. |
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Bibliography: | Application Number: AU20210209105 |