Selectively-pliable chemical vapor deposition (CVD) diamond or other heat spreader

A system includes at least one component (108) configured to generate thermal energy, a heat spreader (100) configured to remove thermal energy from the at least one component, and at least one substrate (110) configured to remove thermal energy from the heat spreader. The heat spreader includes a f...

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Bibliographic Details
Main Authors TRULLI, Susan C, BAR-COHEN, Avram, ALTMAN, David H
Format Patent
LanguageEnglish
Published 01.08.2024
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Summary:A system includes at least one component (108) configured to generate thermal energy, a heat spreader (100) configured to remove thermal energy from the at least one component, and at least one substrate (110) configured to remove thermal energy from the heat spreader. The heat spreader includes a first portion (102) and a second portion (104). The first portion of the heat spreader is coupled to the substrate, and the second portion of the heat spreader is coupled to the at least one component. The first portion of the heat spreader includes high aspect-ratio structures (106) that are separated from one another. The high aspect-ratio structures cause the first portion of the heat spreader to be pliable and able to accommodate a mismatch in coefficients of thermal expansion between a material in the heat spreader and a material in the substrate.
Bibliography:Application Number: AU20200318823