Method of making a Josephson junction based superconductor device
The disclosed method of forming a Josephson junction (JJ) based superconductor device structure comprises forming a base electrode (18) in a first dielectric layer (16) with coplanar surfaces, preferably by a damascene process, forming a junction material stack over the base electrode, forming a har...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
18.04.2019
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Subjects | |
Online Access | Get full text |
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Summary: | The disclosed method of forming a Josephson junction (JJ) based superconductor device structure comprises forming a base electrode (18) in a first dielectric layer (16) with coplanar surfaces, preferably by a damascene process, forming a junction material stack over the base electrode, forming a hardmask (34) over the junction material stack, etching away a portion of the junction material stack to form the JJ (24), depositing a second dielectric layer (22), and forming a first contact (26) through the second dielectric layer to the base electrode and a second contact (28) through the second dielectric layer and the hardmask, preferably by a dual damascene process. |
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Bibliography: | Application Number: AU20170360504 |