Josephson junction superconductor device interconnect

The disclosed method of forming a Josephson junction (JJ) based superconductor device interconnect structure includes forming a base electrode (18) in a coplanar first dielectric layer (16), preferably by a damascene process, depositing a second dielectric layer (20) thereon, forming a first contact...

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Bibliographic Details
Main Authors Graninger, Aurelius L, Rennie, Michael, Kirby, Christopher F
Format Patent
LanguageEnglish
Published 10.10.2019
Subjects
ELECTRICITY
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Summary:The disclosed method of forming a Josephson junction (JJ) based superconductor device interconnect structure includes forming a base electrode (18) in a coplanar first dielectric layer (16), preferably by a damascene process, depositing a second dielectric layer (20) thereon, forming a first contact (22) through the second dielectric layer to a first end of the base electrode, forming a JJ (30) overlying and in contact with the first contact, and forming a second contact (24) through the second dielectric layer to a second end of the base electrode.
Bibliography:Application Number: AU20170358595