Josephson junction superconductor device interconnect
The disclosed method of forming a Josephson junction (JJ) based superconductor device interconnect structure includes forming a base electrode (18) in a coplanar first dielectric layer (16), preferably by a damascene process, depositing a second dielectric layer (20) thereon, forming a first contact...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
10.10.2019
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Subjects | |
Online Access | Get full text |
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Summary: | The disclosed method of forming a Josephson junction (JJ) based superconductor device interconnect structure includes forming a base electrode (18) in a coplanar first dielectric layer (16), preferably by a damascene process, depositing a second dielectric layer (20) thereon, forming a first contact (22) through the second dielectric layer to a first end of the base electrode, forming a JJ (30) overlying and in contact with the first contact, and forming a second contact (24) through the second dielectric layer to a second end of the base electrode. |
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Bibliography: | Application Number: AU20170358595 |