ELECTRICAL RESISTANCE MEASUREMENT APPARATUS AND ELECTRICAL RESISTANCE MEASUREMENT METHOD

• Main Author: HAMANO, AKIHIDE
• Format: Patent
• Language: English
• Published: 24.04.2014
• Subjects: INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES; PHYSICS; TESTING

An electrical resistance measurement apparatus includes a light irradiation unit that irradiates a 5 conductive thin film with terahertz light, a reflection light detection unit that detects reflection light from the conductive thin film, and a computer containing a storage that stores correlation between the reflectance of the terahertz light from the conductive thin film and 10 electrical resistance of the conductive thin film. The computer further containing a processor that determines, reflectance of the terahertz light from the conductive thin film based on a result of detection performed by the reflection light detection unit, and determines the 15 electrical resistance of the conductive thin film based on the correlation and a result of the determination of the reflectance. ELECTRICAL 101 115 RESISTANCE DETERMINATION UNIT 113 SORAGEUNITRADIATION ACQUISITION UNIT STORAGE UNIT 111 REFLECTANCE REFLECTION LIGHTT SAMPLE DETERMINATION UNIT DETECTION UNIT INSTALLATION UNIT 109 108 107 3:OPTICAL PARAMETRIC OSCILLATOR F 6:KTP 4:REFLECTING MIRROR 1:Nd:YAG 2 LASER 2:EXCITATION TAL 8:REFLECTINfG IKT MIRROR 5:TRANSMISSION CRYSTAL 9:1.3 pm BAND DUAL-WAVELENGTH 14:SAMPLE 10 7 10g 11:DAST CRYSTAL 16:DTGS DETECTOR 10:REFLECTING MIRROR 15:REFLECTING MIRROR 12:TERAH ERTZ 13:REFLECTING LIGHT MIRROR