Gas concentration arrangement

The invention relates to the field of increasing the amount of a gas component in a gas mixture, especially of enriching air with oxygen. According to the invention, the gas concentration arrangement comprises: a discharge chamber (1) including an input side and an output side, - a gas discharge dev...

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Bibliographic Details
Main Author HILBIG, RAINER
Format Patent
LanguageEnglish
Published 07.05.2015
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Summary:The invention relates to the field of increasing the amount of a gas component in a gas mixture, especially of enriching air with oxygen. According to the invention, the gas concentration arrangement comprises: a discharge chamber (1) including an input side and an output side, - a gas discharge device (2) for generating a gas discharge inside the discharge chamber (1) for generating a pressure gradient on the output side and/or the input side of the discharge chamber (1), and a gas selection device (3), which is arranged on the input side or the output side of the chamber (1) and which is exposable to a gas flow generated by the pressure gradient.
Bibliography:Application Number: AU20100302301