Gas concentration arrangement
The invention relates to the field of increasing the amount of a gas component in a gas mixture, especially of enriching air with oxygen. According to the invention, the gas concentration arrangement comprises: a discharge chamber (1) including an input side and an output side, - a gas discharge dev...
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Main Author | |
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Format | Patent |
Language | English |
Published |
07.05.2015
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Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to the field of increasing the amount of a gas component in a gas mixture, especially of enriching air with oxygen. According to the invention, the gas concentration arrangement comprises: a discharge chamber (1) including an input side and an output side, - a gas discharge device (2) for generating a gas discharge inside the discharge chamber (1) for generating a pressure gradient on the output side and/or the input side of the discharge chamber (1), and a gas selection device (3), which is arranged on the input side or the output side of the chamber (1) and which is exposable to a gas flow generated by the pressure gradient. |
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Bibliography: | Application Number: AU20100302301 |