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The present invention provides a composition comprising: a dielectric material and b porogen comprising at least two fused aromatic rings wherein each of the fused aromatic rings has at least one alkyl substituent thereon and a bond exists between at least two of the alkyl substituents on adjacent a...

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Main Authors KREISLER LAU, SLEIMAN NASSRIN, RUSLAN ZHEREBIN, AMAUEL GEBREBRHAN, BORIS KOROLEV, NANCY IWAMOTO, JOHN, G. SIKONIA, CHAN-EN LI, ANNATH NAMAN, PAUL, G. APEN
Format Patent
LanguageEnglish
Published 30.07.2003
Edition7
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Summary:The present invention provides a composition comprising: a dielectric material and b porogen comprising at least two fused aromatic rings wherein each of the fused aromatic rings has at least one alkyl substituent thereon and a bond exists between at least two of the alkyl substituents on adjacent aromatic rings. Preferably, the dielectric material is a composition comprising a thermosetting component comprising 1 optionally monomer of Formula I as set forth below and 2 at least one oligomer or polymer of Formula 11 as set forth below where Q, G, h, I, I, and w are as set forth below and b porogen. Preferably, the porogen is selected from the group consisting of unfunctionalized polyacenaphthylene homopolymer, functionalized polyacenaphthylene homopolymer, polyacenaphthylene copolymer, polynorbornene, polycaprolactone, poly 2-vinyl naphthalene, vinyl anthracene, 1s polystyrene, polystyrene derivatives, polysiloxane, polyester, polyether, polyacrylate, aliphatic polycarbonate, polysulfone, polylactide, and blends thereof. The present compositions are particularly useful as dielectric substrate material in microchips, multichip modules, laminated circuit boards, and printed wiring boards.
Bibliography:Application Number: AU20030210504