METHOD FOR MANUFACTURING A PHOTONIC DEVICE AND A PHOTONIC DEVICE

The present invention relates to a photonic device having a first set of layers ( 22 ) including at least a first waveguide layer ( 3 ) arranged in a waveguide mesa ( 61 ). A cladding layer ( 7 ) is arranged on top of the waveguide mesa ( 61 ) and surrounding semiconductor material ( 1 ). A contact...

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Bibliographic Details
Main Authors BJORN STOLTZ, ESKIL BENDZ
Format Patent
LanguageEnglish
Published 22.09.2003
Edition7
Subjects
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Summary:The present invention relates to a photonic device having a first set of layers ( 22 ) including at least a first waveguide layer ( 3 ) arranged in a waveguide mesa ( 61 ). A cladding layer ( 7 ) is arranged on top of the waveguide mesa ( 61 ) and surrounding semiconductor material ( 1 ). A contact layer ( 8 ) is arranged on top of the cladding layer ( 7 ), and a metal contact ( 9, 80 ) is arranged on top of the contact layer ( 8 ). The cladding ( 7 ) and contact ( 8 ) layer are shaped in an etching process to have a mesa structure at least above the waveguide mesa ( 61 ). An insulating material ( 25, 82 ) is also applied around the mesa structure. Optionally a second photonic device having a second set of layers ( 31 ) including at least a second waveguide layer ( 33 ), may be coupled to the first photonic device in a light transmission direction thereof. The invention also relates to a method for manufacturing the photonic device.
Bibliography:Application Number: AU20030210095