Photolithographic method including measurement of the latent image

The contactless nondestructive method for checking and correcting the exposure pattern based upon measurement of the latent image pattern formed in a resist prior to development (figure 1b). The process may be used with various photoresists to form patterns useful as stampers or molds for optical di...

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Bibliographic Details
Main Authors MAGNITSKII, SERGEI, KOZENKOV, VLADIMIR, LEVICH, EUGENE
Format Patent
LanguageEnglish
Published 02.02.2012
Subjects
INFORMATION STORAGE
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
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Summary:The contactless nondestructive method for checking and correcting the exposure pattern based upon measurement of the latent image pattern formed in a resist prior to development (figure 1b). The process may be used with various photoresists to form patterns useful as stampers or molds for optical disks, optical cards, diffractive optics and other minute articles. The method includes illumination of the latent image with light which the photoresist is not sensitive to and measurement of the polarization of that light before and after interacting with exposed and unexposed areas of the photoresist.
Bibliography:Application Number: AU20020222484