AUSGANGSVERBINDUNGEN ZUR ABSCHEIDUNG VON SCHICHTEN, DIE GRUPPE-4-METALLE ENTHALTEN

• Main Authors: MATZ, LAURA M, BUCHANAN, IAIN, SPENCE, DANIEL P, KIM, MOO-SUNG, IVANOV, SERGEI VLADIMIROVICH, LEI, XINJIAN
• Format: Patent
• Language: German
• Published: 15.09.2011

Described herein are Group 4 metal-containing precursors, compositions comprising Group 4 metal-containing precursors, and deposition processes for fabricating conformal metal containing films on substrates. In one aspect, the Group 4 metal-containing precursors are represented by the following formula I: wherein M is a metal chosen from Ti, Zr, and Hf; R and R 1 are each independently selected from an alkyl group comprising from 1 to 10 carbon atoms; R 2 is an alkyl group comprising from 1 to 10 carbon atoms and R 3 is chosen from hydrogen or an alkyl group comprising from 1 to 3 carbon atoms, or R 2 and R 3 together form a C 2 to C 6 alkylene group; R 4 is an alkyl group comprising from 1 to 6 carbon atoms and wherein R 2 and R 4 are different alkyl groups. Also described herein are methods for making Group 4 metal-containing precursors and methods for depositing films using the Group 4 metal-containing precursors.