VAKUUMBEHANDLUNGSKAMMER FÜR SEHR GROSSFLÄCHIGE SUBSTRATE

A plasma reactor for PECVD treatment of large-size substrates according to the invention comprises a vacuum process chamber as an outer chamber and at least one inner reactor with an electrode show-erhead acting as RF antenna, said inner reactor again comprising a reactor bottom and a reactor top, w...

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Bibliographic Details
Main Authors ELYAAKOUBI, MUSTAPHA, DELAUNAY, LAURENT, AING, PHANNARA, JOST, STEPHAN
Format Patent
LanguageGerman
Published 15.04.2008
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Summary:A plasma reactor for PECVD treatment of large-size substrates according to the invention comprises a vacuum process chamber as an outer chamber and at least one inner reactor with an electrode show-erhead acting as RF antenna, said inner reactor again comprising a reactor bottom and a reactor top, whereby stiffeners are supporting the reactor top and/or the reactor bottom, said stiffeners being connected to reactor top (2) and/or reactor bottom (6) via compensation spacers (4) with thicknesses chosen to compensate the thermal expansion during operation.
Bibliography:Application Number: AT20050803234T