MELAMIN ENTHALTENDE FOTOWIDERSTÄNDE MIT HOHER EMPFINDLICHKEIT

Melamine-containing photoresists are disclosed that display increased sensitivity, measured as lithographic potential, when compared to known photoresists that contain melamine resin as a crosslinker. The melamine resin in these photoresists contains a higher percent, by weight, of monomeric hexamet...

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Bibliographic Details
Main Authors BOGAN, LEONARD EDWARD, JR, GRAZIANO, KAREN ANN, OLSEN, ROBERT JAMES, ANDERSON MCILNAY, SUSAN ELIZABETH
Format Patent
LanguageGerman
Published 15.03.1997
Edition6
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:Melamine-containing photoresists are disclosed that display increased sensitivity, measured as lithographic potential, when compared to known photoresists that contain melamine resin as a crosslinker. The melamine resin in these photoresists contains a higher percent, by weight, of monomeric hexamethoxymethylmelamine than in known resists.
Bibliography:Application Number: AT19900307008T