AUFDAMPF-HEIZVORRICHTUNG

• Main Author: CHOW, LOREN A
• Format: Patent
• Language: German
• Published: 15.02.1996
• Edition: 6
• Subjects: BLASTING; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS, OR RETORTS,IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KINDOF FURNACE; DIFFUSION TREATMENT OF METALLIC MATERIAL; FURNACES; FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; HEATING; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; KILNS; LIGHTING; MECHANICAL ENGINEERING; METALLURGY; OPEN SINTERING OR LIKE APPARATUS; OVENS; RETORTS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; WEAPONS

A gaseous deposition source for providing a deposition material that emanates from a crucible having mulitple thin film heating elements formed thereon, with each adjacent pair being separated by an insulating layer therebetween. A gaseous deposition source can have a crucible with a cover thereon with one or more apertures therein and with thin film heating elements on that cover about such apertures. A substrate heater may be used formed of thin film heating elements provided on a base.