Carbon nanopillar array deposition on SiO 2 by ion irradiation through a porous alumina template

A method for producing ordered carbon nanopillar arrays is presented. The method is based on ion irradiation through a small anodic porous alumina membrane, resulting in carbon deposition within the centers of the pores on a gold covered SiO 2 / Si substrate. Samples were irradiated by 4 MeV Cl 2 +...

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Bibliographic Details
Published inVacuum Vol. 82; no. 3; pp. 359 - 362
Main Authors Skupiński, M., Johansson, A., Jarmar, T., Razpet, A., Hjort, K., Boman, M., Possnert, G., Jensen, J.
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 2007
Subjects
Anodic porous alumina membrane
Carbon nanostructures
Carbon pillars
formula omitted
Ion irradiation
Ion lithography
81.16.Dn
Ion irradiation
81.16.−c
81.07.−b
85.40.Hp
SiO 2
61.80.Jh
Carbon nanostructures
Anodic porous alumina membrane
Ion lithography
61.46.Fg
Carbon pillars
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Summary:A method for producing ordered carbon nanopillar arrays is presented. The method is based on ion irradiation through a small anodic porous alumina membrane, resulting in carbon deposition within the centers of the pores on a gold covered SiO 2 / Si substrate. Samples were irradiated by 4 MeV Cl 2 + ions with fluences of 10 15 – 10 16 ions / cm 2 . The combined use of pick’n place positioning of the small porous alumina templates and ion beam irradiation is well suited for post-processing on silicon based integrated circuits. It provides fast local deposition at low temperature of high-density ordered carbon nanopillar arrays in larger silicon based systems, e.g., for field emitting or biosensors applications.
ISSN:0042-207X
1879-2715
DOI:10.1016/j.vacuum.2007.05.002