Structural and optical properties of pulsed laser deposited V 2O 5 thin films

• Published in: Thin solid films Vol. 516; no. 15; pp. 4659 - 4664
• Main Authors: Beke, S., Giorgio, S., Kőrösi, L., Nánai, L., Marine, W.
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 2008
• Subjects: Ablation; Absorption edge; Bohr radius; Optical transmission; Pulsed laser deposition; Transmission Electron Microscopy; Vanadium oxide thin films; X-ray diffraction; X-ray photoelectron spectroscopy; Optical transmission; X-ray diffraction; Pulsed laser deposition; Vanadium oxide thin films; Bohr radius; Ablation; Transmission Electron Microscopy; X-ray photoelectron spectroscopy; Absorption edge
• ISSN: 0040-6090; 1879-2731
• DOI: 10.1016/j.tsf.2007.08.113

Pulsed laser deposited nanocrystalline V 2O 5 thin films were characterized by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), high-resolution transmission electron microscopy (HRTEM) and optical spectroscopy. The films were deposited on amorphous glass substrates, keeping the O 2 partial pressure at 13.33 Pa and the substrate temperature at 220 °C. The characteristics of the films were changed by varying the laser fluence and repetition rate. XRD revealed that films are nanocrystalline with an orthorhombic structure. XPS shows the sub-stoichiometry of the films, that generally relies on the fact that during the formation process of V 2O 5 films, lower valence oxides are also created. From the HRTEM images, we observed the size evolution and distribution characteristics of the clusters in the function of the laser fluence. From the spectral transmittance we determined the absorption edge using the Tauc plot. Calculation of the Bohr radius for V 2O 5 is also reported.