Free radical reactions at the Ru(0 0 0 1) surface: Atomic oxygen and dissociated NH 3
X-ray photoelectron spectroscopy was used to study the effect of atomic oxygen on Ru(0 0 0 1), and the effect of dissociated ammonia on RuO 2/Ru(0 0 0 1), in UHV conditions at ambient temperature. The Ru(0 0 0 1) surface was exposed, at ambient temperature, to a mixed flux of atomic and molecular ox...
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Published in | Surface science Vol. 603; no. 16; pp. 2469 - 2473 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
Elsevier B.V
2009
|
Subjects | |
Online Access | Get full text |
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Summary: | X-ray photoelectron spectroscopy was used to study the effect of atomic oxygen on Ru(0
0
0
1), and the effect of dissociated ammonia on RuO
2/Ru(0
0
0
1), in UHV conditions at ambient temperature. The Ru(0
0
0
1) surface was exposed, at ambient temperature, to a mixed flux of atomic and molecular oxygen generated by dissociation of O
2 in a thermal catalytic cracker, with ∼45% dissociation efficiency. The detailed study of the XPS spectra shows the formation of a disordered multilayer oxide (RuO
2). No formation of higher oxides of Ru was observed. The formation of RuO
2 proceeded without saturation for total oxygen exposures of up to 10
5 Langmuir, at which point an average oxide thickness of 68 Å was observed. RuO
2 formed by the reaction with atomic oxygen was exposed to a flux of NH
x
(
x
=
1, 2)
+
H generated by the cracker. The reduction of RuO
2 to Ru metal was observed by XPS. An exposure of 3.6
×
10
2 L of NH
x
+
H, resulted in the observation of adsorbed H
2O and OH, but no evidence of lattice oxide. The chemisorbed species were removed by additional NH
x
+
H exposure. No nitrogen adsorption was observed. |
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ISSN: | 0039-6028 1879-2758 |
DOI: | 10.1016/j.susc.2009.05.021 |