The influence of CH x coating on the optical properties of porous silicon
In this work, we report a study on the influence of CH x thickness layer on optical properties of CH x /PS/Si structures. The hydrocarbon groups were deposited by plasma of methane–argon mixture. The properties of these structures are investigated by photoluminescence (PL), reflection and spectral r...
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Published in | Physica. E, Low-dimensional systems & nanostructures Vol. 38; no. 1; pp. 168 - 171 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier B.V
2007
|
Subjects | |
Online Access | Get full text |
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Summary: | In this work, we report a study on the influence of CH
x
thickness layer on optical properties of CH
x
/PS/Si structures. The hydrocarbon groups were deposited by plasma of methane–argon mixture.
The properties of these structures are investigated by photoluminescence (PL), reflection and spectral response measurements from where a different behavior depending on CH
x
layer thickness has been observed.
The entire total reflection spectrum is modulated by Fabry–Pérot fringes that are a result of thin film interference. As the CH
x
layer thickness increases, the amplitude of the interferences decreases and a positive shift of the maximum peak is observed.
The PL spectra from CH
x
/PS samples with two CH
x
layer thicknesses show more intense luminescence than that observed from PS sample and the existence of an optimum thickness CH
x
that gives the maximum PL intensity. The spectral response spectra show the presence of an intense peak at 450
nm. Finally, the results point out the importance of CH
x
coating in optoelectronic applications. |
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ISSN: | 1386-9477 1873-1759 |
DOI: | 10.1016/j.physe.2006.12.035 |