Towards atomic level vanadium doping of TiO 2 via liquid-phase atomic layer deposition

• Published in: Applied catalysis. A, General Vol. 409; pp. 87 - 90
• Main Authors: Shen, Yaodong, Foong, Thelese R.B., Hu, Xiao
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 2011
• Subjects: Atomic force microscopy (AFM); Atomic layer epitaxy; Crystalline oxide; Atomic force microscopy (AFM); Crystalline oxide; Atomic layer epitaxy
• ISSN: 0926-860X; 1873-3875
• DOI: 10.1016/j.apcata.2011.09.033

[Display omitted] ► A new, liquid-phase atomic layer deposition has enabled atomic level doping of TiO 2. ► Vanadium doping of TiO 2 via L-ALD results in redshift of band edge by up to 55 nm. ► Up to 500% increase of visible light photocatalytic activity is seen in the V-doped TiO 2. Vanadium-doping of TiO 2 at the atomic level was achieved via a liquid phase atomic layer deposition (L-ALD) method. UV–vis absorption edge of vanadium-doped TiO 2 has been red-shifted ∼55 nm into visible light region. Photocatalytical assessment reveals that the degradation rate of methylene blue (MB) for vanadium-doped TiO 2 under visible light illumination was enhanced by up to 500% compared to the undoped TiO 2. This improvement was believed to be attributed to the atomic level doping of the L-ALD method.