Study of the magnetic anisotropy of amorphous Fe 1− xSi x deposited by magnetron sputtering

The dependence of the magnetic anisotropy of amorphous iron silicide thin films with Si concentration has been investigated. Their anisotropy energies had values above 10 4 erg/cm 3 with coercive fields below 1 Oe. Their easy magnetic axis was always contained in the plane of the substrate. Their or...

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Bibliographic Details
Published inJournal of magnetism and magnetic materials Vol. 242; pp. 166 - 168
Main Authors Dı́az, J., Valvidares, S.M., Morales, R., Alameda, J.M.
Format Journal Article
LanguageEnglish
Published Elsevier B.V 2002
Subjects
Amorphous systems—soft magnetic
Anisotropy—amorphous
EXAFS
Thin films—amorphous
Anisotropy—amorphous
Amorphous systems—soft magnetic
Thin films—amorphous
EXAFS
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Summary:The dependence of the magnetic anisotropy of amorphous iron silicide thin films with Si concentration has been investigated. Their anisotropy energies had values above 10 4 erg/cm 3 with coercive fields below 1 Oe. Their easy magnetic axis was always contained in the plane of the substrate. Their orientation in the plane changed depending on the Si atom concentration. EXAFS spectroscopy was used to understand the correlation between the local environment of the Fe atoms and the magnetic anisotropy of the films.
ISSN:0304-8853
DOI:10.1016/S0304-8853(01)01191-X