Roughness evolution of ZrO 2 thin films grown by reactive ion beam sputtering

A series of zirconium dioxide films were grown on rough borosilicate crown glass substrates with reactive ion beam sputtering technique. The evolution of the surface roughness was studied in the smoothing and roughening growth regimes using atomic force microscopy. By quantitative analysis of surfac...

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Bibliographic Details
Published inThin solid films Vol. 444; no. 1; pp. 146 - 152
Main Authors Qi, H.J., Huang, L.H., Tang, Z.S., Cheng, C.F., Shao, J.D., Fan, Z.X.
Format Journal Article
LanguageEnglish
Published Elsevier B.V 2003
Subjects
Atomic force microscopy (AFM)
Reactive ion beam sputtering
Surface morphology
Zirconium dioxide
Atomic force microscopy (AFM)
Surface morphology
Reactive ion beam sputtering
Zirconium dioxide
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Summary:A series of zirconium dioxide films were grown on rough borosilicate crown glass substrates with reactive ion beam sputtering technique. The evolution of the surface roughness was studied in the smoothing and roughening growth regimes using atomic force microscopy. By quantitative analysis of surface morphology, the interface width of the growth fronts was found to have a minimum during the deposition process. Dynamic scaling was observed for thicker films; the roughness exponent was found to be in the range of 0.7–0.9 and the growth exponent at approximately 0.4.
ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(03)00612-6