Characterization of CN x films prepared by twinned ECR plasma source enhanced DC magnetron sputtering

The DC discharge of a planar magnetron was enhanced by twinned microwave electron cyclotron resonance plasma source. The magnetic cusp geometry formed in the processing chamber was used for plasma confinement. The sputtering discharge characteristics was investigated and a combined mode of voltage a...

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Bibliographic Details
Published inThin solid films Vol. 390; no. 1; pp. 107 - 112
Main Authors Xu, Jun, Deng, Xinlu, Zhang, Jialiang, Lu, Wenqi, Ma, Tengcai
Format Journal Article
LanguageEnglish
Published Elsevier B.V 2001
Subjects
Carbon nitride
Discharge characteristics
Magnetron sputtering
MW-ECR plasma
Magnetron sputtering
Discharge characteristics
MW-ECR plasma
Carbon nitride
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Summary:The DC discharge of a planar magnetron was enhanced by twinned microwave electron cyclotron resonance plasma source. The magnetic cusp geometry formed in the processing chamber was used for plasma confinement. The sputtering discharge characteristics was investigated and a combined mode of voltage and current was observed at a pressure as low as 0.007 Pa. Carbon nitride thin films were synthesized using this method. Characterization of the films showed that the deposition rate was high, and the films were composed of a single amorphous carbon nitride phase with N/C ratio close to that of C 3N 4, with the bonding mainly of CN type.
ISSN:0040-6090
1879-2731
DOI:10.1016/S0040-6090(01)00926-9