Friction and erosive wear of controlled nucleation thermochemically deposited W-C alloys and SiC and chemically vapor-deposited Si 3N 4

The controlled nucleation thermochemical deposition (CNTD) process differs from the conventional chemical vapor deposition (CVD) process in that CNTD results in a fine-grained non-columnar deposit with superior mechanical properties. Materials made by this technique include CM 500 (a WC alloy) and...

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Bibliographic Details
Published inThin solid films Vol. 72; no. 3; pp. 503 - 509
Main Authors Stiglich, Jacob J., Bhat, Deepak G.
Format Journal Article
LanguageEnglish
Published Elsevier B.V 1980
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Summary:The controlled nucleation thermochemical deposition (CNTD) process differs from the conventional chemical vapor deposition (CVD) process in that CNTD results in a fine-grained non-columnar deposit with superior mechanical properties. Materials made by this technique include CM 500 (a WC alloy) and CM 4000 (CNTD SiC). These two materials, together with CVD Si 3N 4, were evaluated for their erosion and sliding wear characteristics and the results were compared with those obtained for conventional refractory and ceramic materials. It is shown that the application of a dense CVD or CNTD coating significantly improves the erosion resistance of substrate materials.
ISSN:0040-6090
1879-2731
DOI:10.1016/0040-6090(80)90539-8