Influence of Bias Voltage on Microstructure and Properties of TiAlSiN Coatings Prepared by HiPIMS

• Published in: Cai liao bao hu Vol. 57; no. 7; pp. 30 - 42
• Main Author: DU Jianrong, TAO Guanyu, CHEN Hui, YI Juan, WAN Hong, LIU Shuyang, ZHANG Yu
• Format: Journal Article
• Language: Chinese
• Published: Editorial Department of Materials Protection 01.07.2024
• Subjects: tialsin coatings;high power impulse magnetron sputtering;substrate bias voltage;microstructure;mechanical properties
• ISSN: 1001-1560
• DOI: 10.16577/j.issn.1001-1560.2024.0148

For investigating the influence and mechanism of bias voltage on the composition structure, mechanical properties and tribological properties of TiAlSiN coatings prepared by high-power pulsed magnetron sputtering(HiPIMS), TiAlSiN coatings were deposited on YG8 hardness alloy and N-type single crystal (111) Si by HiPIMS technology with regulating substrate bias voltage (0～－200 V).The microstructure,composition characterization and performance testing of TiAlSiN coatings were carried out by scanning electron microscopy (SEM),X-ray diffraction (XRD), electron probe microscopy (EPMA), X-ray photoelectron spectroscopy (XPS), ultra depth of field microscopy, white light interferometry, nanoindentation, scratch and reciprocating friction and wear testing machines.Results showed that in terms of HiPIMS discharge behavior, an increase in bias voltage could increase the HiPIMS ignition voltage, but the impact on the discharge voltage and current during the platform stage was not significant.The relative changes in elem