(Invited) Single-Source Precursors for Gas Phase Deposition of Catalytic Coatings for Water Splitting Applications

• Published in: Meeting abstracts (Electrochemical Society) Vol. MA2019-01; no. 31; p. 1616
• Main Authors: Mathur, Sanjay, Jürgensen, Lasse, Fischer, Thomas, Leduc, Jennifer, Möllmann, Alexander
• Format: Journal Article
• Language: English
• Published: 01.05.2019
• ISSN: 2151-2043; 2151-2035
• DOI: 10.1149/MA2019-01/31/1616

Keywords: Single-source precursor, CVD, nanostructured films, catalytic water splitting Investigation of the interplay of metal-organic chemistry will enrich the state-of-the-art of CVD and ALD technology and open new possibilities for the applications of new Ir-based materials. Therefore new heteroleptic Janus -typed compounds exhibiting high volatility and defined thermal decomposition under CVD and ALD conditions are reported to elaborate the precursor chemistry – materials synthesis – functional property chain. The new precursors unify both reactivity and sufficient stability through its heteroleptic constitution to provide a precise control over compositional purity in CVD and ALD deposits. CVD- and ALD-grown materials were tested towards their (electro)catalytic applications, particular in the oxygen evolution reactions. In this work functional characterization of deposited materials will be reported and their catalytic behavior is examined. The deposition on various substrate materials without the need of additional reactant gases underlines the potential of heteroleptic precursor class for CVD and ALD of metallic thin films. The presented CVD data opens new possibilities in the vapor phase synthesis of materials facilitating the application of such films, for example, as electro- or photocatalyst in OER and ORR. Figure 1