Area Dependence of Reliability characteristics for Atomic Layer Deposition HfO 2 Film under Static and Dynamic Stress

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Bibliographic Details
Published inMeeting abstracts (Electrochemical Society) Vol. MA2012-02; no. 31; p. 2604
Main Authors Cheng, Yi-Lung, Chang, You-Ling, Hsieh, Cheng-Yang, Lin, Jian-Run
Format Journal Article
LanguageEnglish
Published 04.06.2012
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ISSN:2151-2043
2151-2035
DOI:10.1149/MA2012-02/31/2604