Investigation of Scaling Limits for PECVD SiN and ALD HfO2/Al2O3 Integrated MIM Capacitors
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Published in | Meeting abstracts (Electrochemical Society) Vol. MA2007-01; no. 14; p. 702 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
01.03.2007
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Online Access | Get full text |
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ISSN: | 2151-2043 2151-2035 |
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DOI: | 10.1149/MA2007-01/14/702 |