Area Dependence of Reliability Characteristics for Atomic Layer Deposition HfO 2 Film under Static and Dynamic Stress

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Bibliographic Details
Published inECS journal of solid state science and technology Vol. 2; no. 5; pp. N125 - N129
Main Authors Cheng, Yi-Lung, Chang, You-Ling, Hsieh, Cheng-Yang, Lin, Jian-Run
Format Journal Article
LanguageEnglish
Published 2013
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ISSN:2162-8769
2162-8777
DOI:10.1149/2.019305jss