Research of the influence of vacuum deposition on the growth rate of MoS 2 films

• Published in: IOP conference series. Materials Science and Engineering Vol. 781; no. 1; p. 12005
• Main Authors: Belikov, A I, Kalinin, V N, Sikov, A V
• Format: Journal Article
• Language: English
• Published: 01.04.2020

Abstract The research results of the working pressure and discharge power influence on the growth rate of molybdenum disulfide thin films on silicon substrates during magnetron sputtering of the target in vacuum are presented. Based on experimental data, an empirical model has been developed that re...