Research of the influence of vacuum deposition on the growth rate of MoS 2 films

Abstract The research results of the working pressure and discharge power influence on the growth rate of molybdenum disulfide thin films on silicon substrates during magnetron sputtering of the target in vacuum are presented. Based on experimental data, an empirical model has been developed that re...

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Bibliographic Details
Published inIOP conference series. Materials Science and Engineering Vol. 781; no. 1; p. 12005
Main Authors Belikov, A I, Kalinin, V N, Sikov, A V
Format Journal Article
LanguageEnglish
Published 01.04.2020
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Summary:Abstract The research results of the working pressure and discharge power influence on the growth rate of molybdenum disulfide thin films on silicon substrates during magnetron sputtering of the target in vacuum are presented. Based on experimental data, an empirical model has been developed that relates the film growth rate to argon pressure and discharge power on a magnetron sputtering system.
ISSN:1757-8981
1757-899X
DOI:10.1088/1757-899X/781/1/012005